imec Presents Quantum Dot Qubit Device Using High NA EUV Lithography
semiconductor-digest.com May 22, 2026

imec Presents Quantum Dot Qubit Device Using High NA EUV Lithography

AI-summarised brief · reviewed before publication

Imec presents a quantum dot qubit device fabricated using High NA EUV lithography, a milestone toward industrial scaling of reliable qubits. This device is the first integrated hardware created using High NA EUV lithography, marking a significant step in quantum computing. Silicon quantum dot spin qubits are considered promising for industrial scaling due to their compatibility with standard computer chip production. Imec's achievement demonstrates the potential for large-scale, manufacturable quantum systems, leveraging decades of semiconductor innovation. The device features gaps of barely 6 nanometers between qubits, enabling the integration of millions of quantum bits on a single chip. This breakthrough builds on imec's previous results with silicon quantum dot spin qubits.

💡 Why It Matters

  • · High NA EUV lithography's role in quantum computing hardware is becoming increasingly crucial, enabling precise patterning of silicon quantum dot qubits.
  • · This technology will be pivotal in fueling the rapid growth of advanced AI and high-performance computing.