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New carbon material fills tiny chip gaps for more powerful processors
ASM International of the Netherlands unveiled XP8 Vertos Flowable Carbon, the first plasma‑enhanced chemical vapor deposition (PECVD) flowable carbon film, on Sept. 22. The material simultaneously fills high‑aspect‑ratio gaps and planarizes complex 3D chip structures in a single PECVD step, eliminating downstream chemical‑mechanical planarization or etch‑back processes. It conforms to intricate features, self‑smooths during deposition, and avoids voids, while offering higher thermal stability and area‑selective deposition. The technology is already in high‑volume manufacturing for both logic and memory [...]