ETEL Launches METIS HP High-Precision Motion Platform
AI-summarised brief · reviewed before publication
ETEL announced the METIS HP, a full‑air‑bearing planar motion platform aimed at step‑and‑scan semiconductor processes such as direct laser writing and high‑resolution optical inspection. The system supports panels up to 600 mm × 600 mm and delivers ±150 nm positioning accuracy across the XY stroke, ±150 nm dynamic straightness at velocities up to 1 m/s, and accelerations of 20 m/s². A multi‑degree‑of‑freedom HEIDENHAIN encoder provides drift‑free measurement and enables projected tool‑point readout, while ETEL’s controller can generate a TTL position trigger, eliminating the need for interferometer mirrors and reducing cost and air‑lens effects. The platform also includes a 4‑DoF high‑bandwidth module for precise Z, tip, tilt and theta adjustments, targeting maskless lithography and packaging inspection. METIS HP is available for OEM integration, will be shown at SEMICON West.
💡 Why It Matters
- · By removing interferometer mirrors, the METIS HP cuts system complexity and latency, enabling faster wafer‑level patterning essential for emerging maskless lithography.
- · Its sub‑150 nm accuracy at 1 m/s lets inspection tools keep pace with higher‑throughput production lines.
