VON ARDENNE Scales HiPIMS Sputtering from Wafers to Panels
AI-summarised brief · reviewed before publication
VON ARDENNE, a Dresden‑based PVD specialist, announced at SEMICON West that its HISS horizontal inline platform will use high‑power impulse magnetron sputtering (HiPIMS) to deposit barrier and seed layers in through‑glass vias (TGVs) on panel‑level semiconductor substrates. The company’s tools accommodate panels up to 650 × 650 mm and operate inline, reducing vacuum breaks and handling risk. By pulsing plasma, HiPIMS improves ion bombardment for conformal coating, offering a cost‑effective alternative to ALD for high‑aspect‑ratio vias. The firm collaborates with glass suppliers and via‑drilling partners to optimize sidewall formation and adhesion layers.
💡 Why It Matters
- · The move enables scalable, high‑throughput panel processing, a critical step as semiconductor devices shift toward larger, panel‑level form factors.
- · It also positions VON ARDENNE to support future optical interposers, expanding the company’s role beyond traditional metal deposition.