ACM Research Enhances Single-Wafer Hot SPM System with Sulfuric Acid Recycle Capability
AI-summarised brief · reviewed before publication
ACM Research, Inc. unveiled an upgraded 170 °C Single‑Wafer Hot Sulfuric Peroxide Mixture (SPM) system that incorporates a sulfuric acid recycle feature. The new design uses a proprietary nozzle to eliminate crystalline deposits, allowing continuous operation without periodic DI water rinsing. Validation at a foundry across more than 50 process layers confirmed particle counts of 15 or fewer at 15 nm, outperforming mainstream solutions. The recycle capability achieves a 70 % acid recovery rate, saving roughly 400 tons of sulfuric acid per tool annually while maintaining stringent particle control.
💡 Why It Matters
- · The system’s high‑efficiency acid reuse cuts chemical waste and operating costs, directly addressing the semiconductor industry’s growing demand for sustainable, low‑maintenance cleaning solutions.