Stacking Up: Inside the Industry’s Race to Build CFET Transistors
AI-summarised brief · reviewed before publication
The semiconductor industry’s next transistor architecture, the complementary FET (CFET), stacks n‑type and p‑type devices vertically to halve logic footprints. Intel, TSMC, Samsung, and IBM Research have fabricated working silicon, showcasing CFET inverters at 45 nm gate pitch with backside PowerVia and Samsung’s three‑nanosheet channel devices at 42 nm. While most groups use monolithic integration, IBM’s Nanostack adopts a sequential bonding approach to avoid thermal limits. Persistent process challenges include contacting buried transistors and etch selectivity. CFET production is projected for the early 2030s, marking a pivotal shift after gate‑all‑around technology.
💡 Why It Matters
- · The successful demonstration of CFETs signals a new era of density and power efficiency, potentially redefining design rules for future chips.
- · It demonstrates that industry leaders are moving beyond gate‑all‑around, opening pathways for next‑generation logic performance.