Gigaphoton Takes Its Lightsources Beyond the Scanner
AI-summarised brief · reviewed before publication
Gigaphoton, a Komatsu subsidiary that has supplied over 2,500 KrF and ArF excimer lasers to DUV scanners for 26 years, announced at SEMICON West that it is expanding beyond lithography into four new fab applications. The company unveiled the G300K, a 248 nm KrF laser delivering 300 W at up to 4 kHz, designed for ultra‑fine ablation of advanced‑packaging substrates. Using mask‑projection optics, the system can drill multiple vias simultaneously, achieving diameters as small as 3 µm with near‑vertical sidewalls and minimal heat‑affected zone, far surpassing CO₂ and 355 nm UV lasers. Gigaphoton also outlined efforts on a compact EUV source, EUV‑based mask inspection, gas‑recycling for neon supply security, and pulsed‑laser deposition for superconducting wire, positioning its short‑wavelength technology for heterogeneous integration and future chiplet interconnects.
💡 Why It Matters
- · By delivering sub‑10 µm vias in a single exposure, Gigaphoton’s excimer laser could eliminate costly multi‑step lithography for chiplet packaging, accelerating the shift to dense heterogeneous integration.