Atomera, IQE Partner on RF GaN-on-Silicon for Volume Markets
semiconductor-digest.com Oct 24, 2026

Atomera, IQE Partner on RF GaN-on-Silicon for Volume Markets

AI-summarised brief · reviewed before publication

Atomera and IQE plc have signed a Joint Development Agreement to demonstrate gallium‑nitride (GaN) epitaxy on Atomera’s Mears Silicon Technology (MST)‑enabled silicon wafers for radio‑frequency (RF) applications. The partnership combines Atomera’s quantum‑engineered silicon substrate, which promises higher transistor performance and lower cost, with IQE’s expertise in compound‑semiconductor epitaxy. Teams will co‑engineer a multi‑layer GaN‑on‑silicon structure aimed at delivering best‑in‑class linearity and loss for high‑volume RF markets, with the intent to produce test wafers for foundries, IDMs and fabless customers. The JDA envisions a multi‑cycle development process and leaves open the possibility of extending the technology to power‑electronics GaN use cases, potentially accelerating MST‑based wafer availability for mainstream markets.

💡 Why It Matters

  • · By marrying low‑cost silicon with high‑performance GaN, the collaboration could unlock affordable, mass‑produced RF components that were previously limited to expensive substrates.